Open AccessA cantilevered liquid‐nitrogen‐cooled silicon mirror for the Advanced Light Source Upgrade
Author(s) -
Cutler Grant,
Cocco Daniele,
DiMasi Elaine,
Morton Simon,
Sanchez del Rio Manuel,
Padmore Howard
Publication year - 2020
Publication title -
journal of synchrotron radiation
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 1.172
H-Index - 99
ISSN - 1600-5775
DOI - 10.1107/s1600577520008930
Subject(s) - strehl ratio , beamline , optics , upgrade , advanced photon source , silicon , physics , polarization (electrochemistry) , desy , materials science , optoelectronics , computer science , chemistry , beam (structure) , adaptive optics , operating system
This paper presents a novel cantilevered liquid‐nitrogen‐cooled silicon mirror design for the first optic in a new soft X‐ray beamline that is being developed as part of the Advanced Light Source Upgrade (ALS‐U) (Lawrence Berkeley National Laboratory, USA). The beamline is optimized for photon energies between 400 and 1400 eV with full polarization control. Calculations indicate that, without correction, this design will achieve a Strehl ratio greater than 0.85 for the entire energy and polarization ranges of the beamline. With a correction achieved by moving the focus 7.5 mm upstream, the minimum Strehl ratio is 0.99. This design is currently the baseline plan for all new ALS‐U insertion device beamlines.