Open AccessX‐ray mirror figure correction by differential deposition and off‐line metrology
Author(s) -
Morawe Christian,
Labouré Sylvain,
Peffen Jean-Christophe,
Perrin François,
Vivo Amparo,
Barrett Raymond
Publication year - 2019
Publication title -
journal of synchrotron radiation
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 1.172
H-Index - 99
ISSN - 1600-5775
DOI - 10.1107/s1600577519012256
Subject(s) - optics , metrology , sputter deposition , x ray optics , surface roughness , materials science , surface finish , deposition (geology) , deconvolution , thin film , context (archaeology) , physics , sputtering , nanotechnology , x ray , geology , composite material , paleontology , sediment
The surface figure error of a hard X‐ray mirror was improved by combining differential deposition and off‐line metrology tools. Thin Cr layers were deposited on flat substrates by DC magnetron sputtering. The substrates were moved in front of a beam‐defining aperture. The required velocity profile was calculated using a deconvolution algorithm. The Cr thickness profiles were measured directly using hard X‐ray reflectivity data. The surface figure was characterized using conventional visible‐light metrology instrumentation (long trace profiler) before and after the deposition. The method converges quickly, and after two iterations the mirror surface figure had improved by a factor of 7. The surface roughness evolves with increasing Cr thickness and deteriorates the quality of subsequent multilayer coatings. The mirror curvature can change upon coating, which complicates the interpretation of the surface metrology data. In this context, the role of layer stress is discussed. Potential improvements of the process are also proposed.