Open AccessA statistical approach to correct X‐ray response non‐uniformity in microstrip detectors for high‐accuracy and high‐resolution total‐scattering measurements
Author(s) -
Kato Kenichi,
Tanaka Yoshihito,
Yamauchi Miho,
Ohara Koji,
Hatsui Takaki
Publication year - 2019
Publication title -
journal of synchrotron radiation
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 1.172
H-Index - 99
ISSN - 1600-5775
DOI - 10.1107/s1600577519002145
Subject(s) - scattering , calibration , detector , optics , physics , standard deviation , noise (video) , poisson distribution , photon , materials science , intensity (physics) , computational physics , mathematics , statistics , computer science , quantum mechanics , artificial intelligence , image (mathematics)
An unbiased approach to correct X‐ray response non‐uniformity in microstrip detectors has been developed based on the statistical estimation that the scattering intensity at a fixed angle from an object is expected to be constant within the Poisson noise. Raw scattering data of SiO 2 glass measured by a microstrip detector module was found to show an accuracy of 12σ PN at an intensity of 10 6 photons, where σ PN is the standard deviation according to the Poisson noise. The conventional flat‐field calibration has failed in correcting the data, whereas the alternative approach used in this article successfully improved the accuracy from 12σ PN to 2σ PN . This approach was applied to total‐scattering data measured by a gapless 15‐modular detector system. The quality of the data is evaluated in terms of the Bragg reflections of Si powder, the diffuse scattering of SiO 2 glass, and the atomic pair distribution function of TiO 2 nanoparticles and Ni powder.