
Ultrahigh‐vacuum organic molecular‐beam deposition system for in situ growth and characterization
Author(s) -
Annese Emilia,
dos Santos Joacir E.,
Rodrigues Gustavo Lorencini M. P.,
Rocha Andre Silva,
de Moraes Horacio Ribeiro,
Cezar Julio Criginski
Publication year - 2018
Publication title -
journal of synchrotron radiation
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 1.172
H-Index - 99
ISSN - 1600-5775
DOI - 10.1107/s1600577518011955
Subject(s) - beamline , characterization (materials science) , materials science , synchrotron , thin film , deposition (geology) , in situ , nanotechnology , ultra high vacuum , vacuum deposition , heterojunction , molecular beam , optoelectronics , optics , beam (structure) , chemistry , molecule , organic chemistry , paleontology , physics , sediment , biology
A compact ultrahigh‐vacuum molecular‐beam deposition system has been developed for the in situ synthesis of organic thin films and multilayers. The system incorporates all the features (heater, thickness monitor, evaporators) necessary for controlled organic thin‐film growth. It can be used independently, or it can be docked to the in situ growth system and transferred to other instruments of the PGM beamline, thus allowing extensive film preparation and characterization. A manipulator dedicated to specimen preparation and organic‐film deposition with temperature control between 200 K and ∼800 K has been developed. The design and performance of the system are reported with emphasis on a novel solution of masks developed to achieve position‐dependent film deposition. To demonstrate the enhanced capabilities of the PGM beamline in the growth and in the characterization of electronic‐structure studies of organic molecular films and their heterostructures through synchrotron‐based spectroscopies, this paper presents some preliminary results of a study of Fe‐phthalocyanine growth on Si substrates and on in situ prepared La 0.67 Sr 0.33 MnO 3 buffer layers on SrTiO 3 single crystal.