Open AccessThickness‐dependent structural characteristics for a sputtering‐deposited chromium monolayer and Cr/C and Cr/Sc multilayers
Author(s) -
Jiang Hui,
Wang Hua,
Zhu Jingtao,
Xue Chaofan,
Zhang Jiayi,
Tian Naxi,
Li Aiguo
Publication year - 2018
Publication title -
journal of synchrotron radiation
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 1.172
H-Index - 99
ISSN - 1600-5775
DOI - 10.1107/s1600577518005143
Subject(s) - monolayer , materials science , chromium , crystallinity , sputtering , layer (electronics) , thin film , sputter deposition , diffusion , thermal stability , deposition (geology) , alloy , foil method , crystallography , analytical chemistry (journal) , chemical engineering , nanotechnology , metallurgy , composite material , chemistry , paleontology , physics , chromatography , sediment , biology , engineering , thermodynamics
The interior structure, morphology and ligand surrounding of a sputtering‐deposited chromium monolayer and Cr/C and Cr/Sc multilayers are determined by various hard X‐ray techniques in order to reveal the growth characteristics of Cr‐based thin films. A Cr monolayer presents a three‐stage growth mode with sudden changes occurring at a layer thickness of ∼2 nm and beyond 6 nm. Cr‐based multilayers are proven to have denser structures due to interfacial diffusion and layer growth mode. Cr/C and Cr/Sc multilayers have different interfacial widths resulting from asymmetry, degree of crystallinity and thermal stability. Cr/Sc multilayers present similar ligand surroundings to Cr foil, whereas Cr/C multilayers are similar to Cr monolayers. The aim of this study is to help understand the structural evolution regulation versus layer thickness and to improve the deposition technology of Cr‐based thin films, in particular for obtaining stable Cr‐based multilayers with ultra‐short periods.