Open AccessAn in situ atomic force microscope for normal‐incidence nanofocus X‐ray experiments
Author(s) -
Vitorino M. V.,
Fuchs Y.,
Dane T.,
Rodrigues M. S.,
Rosenthal M.,
Panzarella A.,
Bernard P.,
Hignette O.,
Dupuy L.,
Burghammer M.,
Costa L.
Publication year - 2016
Publication title -
journal of synchrotron radiation
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 1.172
H-Index - 99
ISSN - 1600-5775
DOI - 10.1107/s1600577516011437
Subject(s) - synchrotron radiation , x ray , synchrotron , microscope , atomic force microscopy , materials science , optics , in situ , characterization (materials science) , beam (structure) , microscopy , resolution (logic) , physics , nanotechnology , artificial intelligence , meteorology , computer science
A compact high‐speed X‐ray atomic force microscope has been developed for in situ use in normal‐incidence X‐ray experiments on synchrotron beamlines, allowing for simultaneous characterization of samples in direct space with nanometric lateral resolution while employing nanofocused X‐ray beams. In the present work the instrument is used to observe radiation damage effects produced by an intense X‐ray nanobeam on a semiconducting organic thin film. The formation of micrometric holes induced by the beam occurring on a timescale of seconds is characterized.