Open AccessStructural characterization and low‐temperature properties of Ru/C multilayer monochromators with different periodic thicknesses
Author(s) -
Jiang Hui,
He Yan,
He Yumei,
Li Aiguo,
Wang Hua,
Zheng Yi,
Dong Zhaohui
Publication year - 2015
Publication title -
journal of synchrotron radiation
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 1.172
H-Index - 99
ISSN - 1600-5775
DOI - 10.1107/s1600577515017828
Subject(s) - undulator , materials science , optics , characterization (materials science) , reflection (computer programming) , beamline , reflectometry , crystallization , thermal , optoelectronics , radiation , chemistry , nanotechnology , physics , time domain , beam (structure) , organic chemistry , meteorology , computer science , computer vision , programming language
Ru/C multilayer monochromators with different periodic thicknesses were investigated using X‐ray grazing‐incidence reflectivity, diffuse scattering, Bragg imaging, morphology testing, etc. before and after cryogenic cooling. Quantitative analyses enabled the determination of the key multilayer structural parameters for samples with different periodic thicknesses, especially the influence from the ruthenium crystallization. The results also reveal that the basic structures and reflection performance keep stable after cryogenic cooling. The low‐temperature treatment smoothed the surfaces and interfaces and changed the growth characteristic to a low‐frequency surface figure. This study helps with the understanding of the structure evolution of multilayer monochromators during cryogenic cooling and presents sufficient experimental proof for using cryogenically cooled multilayer monochromators in a high‐thermal‐load undulator beamline.