Open AccessUpgrade of beamline BL08B at Taiwan Light Source from a photon‐BPM to a double‐grating SGM beamline
Author(s) -
Yuh JihYoung,
Lin ShanWei,
Huang LiangJen,
Fung HokSum,
Lee LongLife,
Chen YuJoung,
Cheng ChiuPing,
Chin YiYing,
Lin HongJi
Publication year - 2015
Publication title -
journal of synchrotron radiation
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 1.172
H-Index - 99
ISSN - 1600-5775
DOI - 10.1107/s1600577515014009
Subject(s) - beamline , monochromator , optics , grating , extreme ultraviolet , extreme ultraviolet lithography , physics , photon energy , photon , materials science , beam (structure) , laser , wavelength
During the last 20 years, beamline BL08B has been upgraded step by step from a photon beam‐position monitor (BPM) to a testing beamline and a single‐grating beamline that enables experiments to record X‐ray photo‐emission spectra (XPS) and X‐ray absorption spectra (XAS) for research in solar physics, organic semiconductor materials and spinel oxides, with soft X‐ray photon energies in the range 300–1000 eV. Demands for photon energy to extend to the extreme ultraviolet region for applications in nano‐fabrication and topological thin films are increasing. The basic spherical‐grating monochromator beamline was again upgraded by adding a second grating that delivers photons of energy from 80 to 420 eV. Four end‐stations were designed for experiments with XPS, XAS, interstellar photoprocess systems (IPS) and extreme‐ultraviolet lithography (EUVL) in the scheduled beam time. The data from these experiments show a large count rate in core levels probed and excellent statistics on background normalization in the L ‐edge adsorption spectrum.