
Optimal azimuthal orientation for Si(111) double‐crystal monochromators to achieve the least amount of glitches in the hard X‐ray region
Author(s) -
Tang Zheng,
Zheng Lirong,
Chu Shengqi,
Wu Min,
An Pengfei,
Zhang Long,
Hu Tiandou
Publication year - 2015
Publication title -
journal of synchrotron radiation
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 1.172
H-Index - 99
ISSN - 1600-5775
DOI - 10.1107/s1600577515012345
Subject(s) - azimuth , glitch , superposition principle , orientation (vector space) , crystal (programming language) , physics , x ray , optics , materials science , crystallography , computational physics , geometry , computer science , chemistry , mathematics , quantum mechanics , detector , programming language
Simulations of the periods, split regularities and mirror symmetries of the glitch pattern of a Si(111) crystal along with the azimuthal angles are presented. The glitch patterns of Si(111) double‐crystal monochromators (DCMs) are found to be the superposition of the two sets of glitch patterns from the two crystals. The optimal azimuthal orientation ϕ 1,2 = [(2 n +1)π]/6 ( n = 0, ±1, ±2…) for Si(111) DCMs to achieve the least amount of glitches in the hard X‐ray region has been suggested.