Open AccessDesign and performance of the APPLE‐Knot undulator
Author(s) -
Ji Fuhao,
Chang Rui,
Zhou Qiaogen,
Zhang Wei,
Ye Mao,
Sasaki Shigemi,
Qiao Shan
Publication year - 2015
Publication title -
journal of synchrotron radiation
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 1.172
H-Index - 99
ISSN - 1600-5775
DOI - 10.1107/s1600577515006062
Subject(s) - undulator , beamline , thermal emittance , optics , heat load , synchrotron radiation , synchrotron , physics , brightness , particle accelerator , photon , knot (papermaking) , polarization (electrochemistry) , materials science , beam (structure) , chemistry , composite material , thermodynamics
Along with the development of accelerator technology, synchrotron emittance has continuously decreased. This results in increased brightness, but also causes a heavy heat load on beamline optics. Recently, optical surfaces with 0.1 nm micro‐roughness and 0.05 µrad slope error (r.m.s.) have become commercially available and surface distortions due to heat load have become a key factor in determining beamline performance, and heat load has become a serious problem at modern synchrotron radiation facilities. Here, APPLE‐Knot undulators which can generate photons with arbitrary polarization, with low on‐axis heat load, are reported.