Open AccessProfile etching for prefiguring X‐ray mirrors
Author(s) -
Liu Chian,
Qian Jun,
Assoufid Lahsen
Publication year - 2015
Publication title -
journal of synchrotron radiation
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 1.172
H-Index - 99
ISSN - 1600-5775
DOI - 10.1107/s1600577515000624
Subject(s) - etching (microfabrication) , optics , substrate (aquarium) , coating , materials science , beam (structure) , surface finish , cylinder , physics , layer (electronics) , nanotechnology , geometry , mathematics , composite material , geology , oceanography
A method to pre‐shape mirror substrates through etching with a broad‐beam ion source and a contoured mask is presented. A 100 mm‐long elliptical cylinder substrate was obtained from a super‐polished flat Si substrate with a 48 nm root‐mean‐square (r.m.s.) figure error and a 1.5 Å r.m.s. roughness after one profile‐etching process at a beam voltage of 600 V without iteration. A follow‐up profile coating can be used to achieve a final mirror. Profile etching and profile coating combined provide an economic way to make X‐ray optics, such as nested Kirkpatrick–Baez mirrors.