Open AccessDirect nano‐scale patterning of Ag films using hard X‐ray induced oxidation
Author(s) -
Kim Jae Myung,
Lee Su Yong,
Kang Hyon Chol,
Noh Do Young
Publication year - 2015
Publication title -
journal of synchrotron radiation
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 1.172
H-Index - 99
ISSN - 1600-5775
DOI - 10.1107/s1600577514023534
Subject(s) - materials science , nanoscopic scale , nano , metal , synchrotron radiation , silicon , silicon nitride , nitride , synchrotron , nanotechnology , line width , irradiation , x ray , thin film , silver nano , optoelectronics , optics , composite material , metallurgy , layer (electronics) , physics , nuclear physics
The morphological change of silver nano‐particles (AgNPs) exposed to an intense synchrotron X‐ray beam was investigated for the purpose of direct nano‐scale patterning of metal thin films. AgNPs irradiated by hard X‐rays in oxygen ambient were oxidized and migrated out of the illuminated region. The observed X‐ray induced oxidation was utilized to fabricate nano‐scale metal line patterns using sectioned WSi 2 /Si multilayers as masks. Lines with a width as small as 21 nm were successfully fabricated on Ag films on silicon nitride. Au/Ag nano‐lines were also fabricated using the proposed method.