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Crystallographic anisotropy in surface properties of brass and its dependence on the electron work function
Author(s) -
Guo Liqiu,
Lu Hao,
Li D. Y.,
Huang Q. X.,
Wang Xu,
Szpunar J. A.
Publication year - 2018
Publication title -
journal of applied crystallography
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 1.429
H-Index - 162
ISSN - 1600-5767
DOI - 10.1107/s160057671801573x
Subject(s) - work function , brass , anisotropy , work (physics) , deformation (meteorology) , materials science , electron , condensed matter physics , surface energy , electron microscope , surface (topology) , chemistry , crystallography , nanotechnology , composite material , physics , thermodynamics , optics , geometry , metallurgy , copper , mathematics , layer (electronics) , quantum mechanics
The crystallographic anisotropy of the electric current or conductance, adhesive force, elastic modulus, and deformation magnitude of alpha brass were investigated through property mapping using an atomic force microscope. Surface electron work functions of differently oriented grains in the brass were also analyzed using atomic force microscopy. The mapped surface properties are closely related to the electron work function; the work function reflects the surface activity, which is itself dependent on the surface energy. The anisotropy of the properties is closely correlated to the in situ measured surface electron work function. It is demonstrated that crystallographic planes with higher electron work functions exhibit lower current, smaller adhesive forces, larger elastic moduli and smaller deformation magnitudes. Efforts are made to understand the relationships by connecting the properties with surface energy and electron work function. The dependence of the properties on crystallographic orientation can be elucidated by considering the surface electron behavior using electron work function as a novel probing parameter.