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A valence‐selective X‐ray fluorescence holography study of an yttrium oxide thin film
Author(s) -
Stellhorn J. R.,
Hosokawa S.,
Happo N.,
Tajiri H.,
Matsushita T.,
Kaminaga K.,
Fukumura T.,
Hasegawa T.,
Hayashi K.
Publication year - 2017
Publication title -
journal of applied crystallography
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 1.429
H-Index - 162
ISSN - 1600-5767
DOI - 10.1107/s1600576717012821
Subject(s) - valence (chemistry) , thin film , yttrium , holography , fluorescence , analytical chemistry (journal) , pulsed laser deposition , absorption edge , materials science , chemistry , oxide , optics , optoelectronics , physics , nanotechnology , organic chemistry , chromatography , band gap , metallurgy
The first direct valence‐selective structure determination by X‐ray fluorescence holography is reported. The method is applied to investigate an epitaxial thin film of the rare earth monoxide YO, which has recently been synthesized by pulsed laser deposition. The surface of the sample is easily oxidized to Y 2 O 3 . In order to separate the structural information connected with the two different valence states of Y, the X‐ray fluorescence holography measurements were performed close to the Y K absorption edge. Using the shift of the absorption edge for the different valence states, very different relative contributions of YO and Y 2 O 3 are obtained. Thus, it is possible to distinguish the crystal structures of YO and Y 2 O 3 in the thin‐film sample.