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Multiparameter characterization of subnanometre Cr/Sc multilayers based on complementary measurements
Author(s) -
Haase Anton,
Bajt Saša,
Hönicke Philipp,
Soltwisch Victor,
Scholze Frank
Publication year - 2016
Publication title -
journal of applied crystallography
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 1.429
H-Index - 162
ISSN - 1600-5767
DOI - 10.1107/s1600576716015776
Subject(s) - extreme ultraviolet lithography , characterization (materials science) , materials science , monte carlo method , optics , scattering , range (aeronautics) , computational physics , physics , statistics , mathematics , composite material
Cr/Sc multilayer systems can be used as near‐normal incidence mirrors for the water window spectral range. It is shown that a detailed characterization of these multilayer systems with 400 bilayers of Cr and Sc, each with individual layer thicknesses <1 nm, is attainable by the combination of several analytical techniques. EUV and X‐ray reflectance measurements, resonant EUV reflectance across the Sc L edge, and X‐ray standing wave fluorescence measurements were used. The parameters of the multilayer model were determined via a particle‐swarm optimizer and validated using a Markov chain Monte Carlo maximum‐likelihood approach. For the determination of the interface roughness, diffuse scattering measurements were conducted.