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Detection of medium‐range‐order structure in amorphous germanium films by spectroscopic ellipsometry
Author(s) -
Wang XiaoDong,
Chen Bo,
Wang HaiFeng,
Chen Bin,
Liu ShiJie,
Cui ZhongXu,
Li Bo,
Wang JunBo,
Wang ShanMeng,
Li YunPeng
Publication year - 2015
Publication title -
journal of applied crystallography
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 1.429
H-Index - 162
ISSN - 1600-5767
DOI - 10.1107/s1600576715009619
Subject(s) - germanium , ellipsometry , amorphous solid , materials science , sputter deposition , range (aeronautics) , deposition (geology) , analytical chemistry (journal) , optics , germanium compounds , sputtering , optoelectronics , thin film , crystallography , chemistry , nanotechnology , silicon , physics , composite material , chromatography , paleontology , sediment , biology
Amorphous germanium (a‐Ge) films in the thickness range of 5.2–370.7 nm were prepared by radio frequency magnetron sputtering. Spectroscopic ellipsometry analysis shows that less than 3% of medium‐range order exists in a‐Ge under the reported deposition conditions.