Open AccessEffective escape depth of photoelectrons for hydrocarbon films in total electron yield measurement as C K‐edge
Author(s) -
Ohara H.,
Yamamoto Y.,
Kajikawa K.,
Ishii H.,
Seki K.,
Ouchi Y.
Publication year - 1999
Publication title -
journal of synchrotron radiation
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 1.172
H-Index - 99
ISSN - 1600-5775
DOI - 10.1107/s0909049599004033
Subject(s) - photoelectric effect , yield (engineering) , enhanced data rates for gsm evolution , hydrocarbon , electron , materials science , physics , atomic physics , analytical chemistry (journal) , chemistry , optics , environmental chemistry , organic chemistry , nuclear physics , computer science , composite material , telecommunications
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