z-logo
open-access-imgOpen Access
Gallium K ‐edge EXAFS measurements on cubic and hexagonal GaN
Author(s) -
Katsikini M.,
Rossner H.,
FieberErdmann M.,
HolubKrappe E.,
Moustakas T. D.,
Paloura E. C.
Publication year - 1999
Publication title -
journal of synchrotron radiation
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 1.172
H-Index - 99
ISSN - 1600-5775
DOI - 10.1107/s090904959900151x
Subject(s) - gallium , extended x ray absorption fine structure , materials science , hexagonal crystal system , microstructure , relaxation (psychology) , lattice (music) , enhanced data rates for gsm evolution , crystallography , atom (system on chip) , shell (structure) , k nearest neighbors algorithm , condensed matter physics , molecular physics , chemistry , absorption spectroscopy , physics , optics , telecommunications , metallurgy , psychology , social psychology , artificial intelligence , acoustics , embedded system , composite material , computer science
The microstructure of undoped cubic and hexagonal GaN films is studied using temperature dependent Ga K-edge EXAFS measurements (10K-290K). The microstructure around the Ga atom is distorted due to a splitting of the second nearest neighbor shell, which consists of Ga atoms. This splitting results in an additional Ga path at a distance longer than expected by 0.8±0.05 A and is attributed to local lattice relaxation around nitrogen vacancies. From the temperature dependence of the DW factors for the 2 nd nearest neighbor shell of Ga, the Einstein temperature is equal to 318±25K.

The content you want is available to Zendy users.

Already have an account? Click here to sign in.
Having issues? You can contact us here
Accelerating Research

Address

John Eccles House
Robert Robinson Avenue,
Oxford Science Park, Oxford
OX4 4GP, United Kingdom