Enhancement of the Refl‐EXAFS sensitivity using the whispering gallery effect | Zendy

Chernov V. | Zendy; Mytnichenko S. V. | Zendy; Lee J. | Zendy

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Enhancement of the Refl‐EXAFS sensitivity using the whispering gallery effect

Author(s) -

Chernov V.,

Mytnichenko S. V.,

Lee J.

Publication year - 1999

Publication title -

journal of synchrotron radiation

Language(s) - English

Resource type - Journals

SCImago Journal Rank - 1.172

H-Index - 99

ISSN - 1600-5775

DOI - 10.1107/s090904959801810x

Subject(s) - sensitivity (control systems) , extended x ray absorption fine structure , whispering gallery wave , materials science , optics , physics , laser , absorption spectroscopy , engineering , electronic engineering

A new approach to enhancing the sensitivity for the reflection EXAFS signal is described. A method that uses the whispering gallery effect was realized in principle, implementing the optical guiding effect by a simple curved-mirror geometry. The multiple total reflection (MTR) phenomenon highly increases x-ray interaction with the waveguide surface and hence offers higher sensitivity compared to conventional (single reflection) REFLEXAFS. The Ge K-edge REFL-EXAFS measurements were performed using both the MTR and conventional (single reflection) techniques for a GeO2 3 ,~, thick film grown on a silica mirror. The MTR technique allows one to achieve about 20-fold gain in the signal-to-background ratio compared to the conventional technique.

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