Open AccessUltrahigh‐Vacuum Reaction Apparatus to Study Synchrotron‐Radiation‐Stimulated Processes
Author(s) -
Hirano S.,
Yoshigoe A.,
Nagasono M.,
Mase K.,
Ohara J.,
ogaki Y.,
Takeda Y.,
Urisu T.
Publication year - 1998
Publication title -
journal of synchrotron radiation
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 1.172
H-Index - 99
ISSN - 1600-5775
DOI - 10.1107/s0909049598011534
Subject(s) - synchrotron radiation , beamline , synchrotron , storage ring , reflection high energy electron diffraction , absorption (acoustics) , chemistry , high energy x rays , etching (microfabrication) , materials science , optics , chemical vapor deposition , reflection (computer programming) , layer (electronics) , electron diffraction , optoelectronics , diffraction , physics , nanotechnology , beam (structure) , computer science , programming language
An ultrahigh‐vacuum reaction apparatus to study synchrotron‐radiation‐stimulated processes has been constructed and placed on beamline 4B of the synchrotron radiation storage ring (UVSOR) at the Institute for Molecular Science. The apparatus is designed so that multiple synchrotron radiation processes such as etching and chemical vapour deposition can be carried out successively without breaking the high vacuum. It is equipped with IR reflection absorption spectroscopy (IRRAS) apparatus and reflective high‐energy electron diffraction (RHEED) apparatus for in situ observations. The basic parameters of the apparatus including etching and deposition rates have been measured. IRRAS using buried metal layer substrates has been confirmed to be a very useful method of analyzing the reaction mechanisms of the synchrotron‐radiation‐stimulated processes.