Open AccessA simple accurate method of alignment of beamline optics with the use of EUV multilayer polarizers
Author(s) -
Yamamoto Masaki,
Furudate Minaji,
Yanagihara Mihiro,
Kimura Hiroaki
Publication year - 1998
Publication title -
journal of synchrotron radiation
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 1.172
H-Index - 99
ISSN - 1600-5775
DOI - 10.1107/s0909049598000697
Subject(s) - beamline , optics , extreme ultraviolet lithography , polarizer , polarization (electrochemistry) , synchrotron radiation , physics , extreme ultraviolet , photon , radiation , photon energy , linear polarization , optoelectronics , materials science , beam (structure) , laser , chemistry , birefringence
A simple alignment method is proposed, which enables the alignment of beamline optics of a bending section accurately, relying on the linear state of polarization of synchrotron orbital radiation rather than the beam intensity. The method utilizes extreme UV (EUV) multilayers as a compact polarization monitor detecting unwanted vertical polarization components. The proposed method was found to be far more sensitive than that relying on the maximum intensity. Another advantage is the insensitivity to surface contamination, such as an irradiation mark on the mirror degrading reflectance. A design example is presented for use around a photon energy of 370 eV along with an experimental example at a photon energy of 97 eV.