Open Access(Ta/Si) multilayer as a wide‐bandpass monochromator material
Author(s) -
Park Y. J.,
Youn H. S.,
Banerjee S.,
Lee D. R.,
Baik H. M.,
Lee K.B.,
Kim K. J.,
Moon D. W.
Publication year - 1998
Publication title -
journal of synchrotron radiation
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 1.172
H-Index - 99
ISSN - 1600-5775
DOI - 10.1107/s0909049597020311
Subject(s) - monochromator , specular reflection , reflectivity , materials science , optics , band pass filter , scattering , optoelectronics , physics , wavelength
Specular and non‐specular X‐ray reflectivity intensities of a (Ta/Si) 60 multilayer sample were measured to characterize its interface structure. Since the multilayer has a good reflectance at its multilayer peaks, its performance as a wide‐bandpass monochromator for X‐ray scattering experiments of polymers has been tested.