Open AccessFabrication of Mo/Al multilayer films for a wavelength of 18.5 nm
Author(s) -
Nii H.,
Niibe M.,
Kinoshita H.,
Sugie Y.
Publication year - 1998
Publication title -
journal of synchrotron radiation
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 1.172
H-Index - 99
ISSN - 1600-5775
DOI - 10.1107/s0909049597019407
Subject(s) - fabrication , materials science , surface roughness , sputter deposition , wavelength , surface finish , reflectivity , layer (electronics) , optics , sputtering , optoelectronics , deposition (geology) , thin film , nanotechnology , composite material , medicine , paleontology , alternative medicine , physics , pathology , sediment , biology
This paper reports the fabrication and evaluation of Mo/Al and Mo/Si multilayer films (MLs) for a wavelength of 18.5 nm. Calculated reflectivities of Mo/Al MLs at an incident angle of 10° were about 7% higher than those of Mo/Si MLs. MLs were fabricated using an RF‐magnetron sputtering deposition system. The measured reflectivity of Mo/Al MLs was 33.5%. The cause of the decreasing reflectivity was supposed to be the surface and interfacial roughness. In the surface observation utilizing atomic force microscopy, the surface roughness of Mo/Al MLs was dominated by the Al layer. Therefore, the conditions for fabricating Al films were optimized.