Open AccessSoft X‐ray multilayer beam splitters
Author(s) -
Haga Tsuneyuki,
Ti Marcia C. K.,
Shimada Masaru,
Ohkubo Takashi,
Ozawa Akira
Publication year - 1998
Publication title -
journal of synchrotron radiation
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 1.172
H-Index - 99
ISSN - 1600-5775
DOI - 10.1107/s0909049597019389
Subject(s) - flatness (cosmology) , beam splitter , optics , materials science , fabrication , transmittance , beam (structure) , polishing , synchrotron radiation , optoelectronics , polarization (electrochemistry) , physics , composite material , laser , chemistry , medicine , alternative medicine , cosmology , pathology , quantum mechanics
A semitransparent Mo/Si multilayer beam splitter with a completely self‐standing active area (10 × 10 mm) and a flatness of 1.1 nm (r.m.s.) was fabricated. The influence of the roughness of the membrane substrate on the reflectivity of a beam splitter was investigated for different materials and deposition schemes. Precise control of multilayer stress to give a slightly tensile state not only enables the fabrication of a large and flat reflection surface, but also makes it possible to etch away the supporting membrane and obtain a completely self‐standing structure. The performance evaluation using synchrotron radiation revealed that the fabricated beam splitter works as a one‐to‐one beam splitter whose reflectivity and transmittance are both 27% ( s ‐polarization, 45°, λ = 13.4 nm).