Open AccessGraded X‐ray Optics for Synchrotron Radiation Applications
Author(s) -
Erko A.,
Veldkamp M.,
Gudat W.,
Abrosimov N. V.,
Rossolenko S. N.,
Shekhtman V.,
Khasanov S.,
Alex V.,
Groth S.,
Schröder W.,
Vidal B.,
Yakshin A.
Publication year - 1998
Publication title -
journal of synchrotron radiation
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 1.172
H-Index - 99
ISSN - 1600-5775
DOI - 10.1107/s0909049597019043
Subject(s) - synchrotron radiation , x ray , optics , materials science , aperiodic graph , sputter deposition , radiation , synchrotron , x ray crystallography , crystal (programming language) , sputtering , lattice constant , crystallography , diffraction , optoelectronics , physics , thin film , chemistry , nanotechnology , mathematics , combinatorics , computer science , programming language
Using X‐ray diffractometry and spectral measurements, the structure and properties of graded X‐ray optical elements have been examined. Experimental and theoretical data on X‐ray supermirrors, which were prepared by the magnetron sputtering technique using precise thickness control, are reported. Measurements on graded aperiodic Si 1− x Ge x single crystals, which were grown by the Czochralski technique, are also presented. The lattice parameter of such a crystal changes almost linearly with increasing Ge concentration. The measurements indicate that Si 1− x Ge x crystals with concentrations up to 7 at.% Ge can be grown with a quality comparable to that of pure Si crystals.