Open AccessDesign of beamline optics for EUVL
Author(s) -
Watanabe Takeo,
Haga Tsuneyuki,
Niibe Masahito,
Kinoshita Hiroo
Publication year - 1998
Publication title -
journal of synchrotron radiation
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 1.172
H-Index - 99
ISSN - 1600-5775
DOI - 10.1107/s0909049597017536
Subject(s) - optics , collimated light , toroid , extreme ultraviolet lithography , curved mirror , physics , x ray optics , lithography , ray tracing (physics) , geometrical optics , parabolic reflector , extreme ultraviolet , photolithography , deformable mirror , adaptive optics , laser , plasma , quantum mechanics , x ray
The design of front‐end collimating optics for extreme‐ultraviolet lithography (EUVL) is reported. For EUVL, collimating optics consisting of a concave toroidal mirror and a convex toroidal mirror can achieve shorter optical path lengths than collimating optics consisting of two concave toroidal mirrors. Collimating optics consisting of a concave toroidal mirror and a convex toroidal mirror are discussed. The design of collimating optics for EUVL beamlines based on ray‐tracing studies is described.