Open AccessHigher‐order suppression in diffraction‐grating monochromators using thin films
Author(s) -
Quinn F. M.,
Teehan D.,
MacDonald M.,
Downes S.,
Bailey P.
Publication year - 1998
Publication title -
journal of synchrotron radiation
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 1.172
H-Index - 99
ISSN - 1600-5775
DOI - 10.1107/s0909049597016440
Subject(s) - extreme ultraviolet , optics , diffraction , synchrotron radiation , diffraction grating , materials science , transmission (telecommunications) , absorption (acoustics) , grating , photon , optoelectronics , synchrotron , physics , computer science , laser , telecommunications
Although a continuously tuneable source of photons is a very desirable feature of synchrotron radiation it has one main drawback: the contamination of the photon beam by higher‐order diffracted light. Several elements have absorption edges which lie between 10 and 200 eV, a range prone to high second‐ and third‐order content in XUV monochromators. They can, therefore, be used as transmission filters to reduce this higher‐order content. This paper describes the use of thin filters to reduce the higher‐order content in diffraction‐grating monochromators. Their suppression efficiency, transmission and ageing have been characterized using photoelectron spectroscopy and compared with calculated values. The effect of oxide contamination on their performance has been assessed. Filters are now installed on eight XUV beamlines and have been in routine use for several years.