Open AccessOptical design of the U7 undulator beamline at the Pohang Light Source
Author(s) -
Shin HyunJoon,
Chung Y.,
Kim Bongsoo
Publication year - 1998
Publication title -
journal of synchrotron radiation
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 1.172
H-Index - 99
ISSN - 1600-5775
DOI - 10.1107/s0909049597016142
Subject(s) - beamline , monochromator , undulator , optics , photon energy , grating , physics , photon , laser , beam (structure) , wavelength
The first insertion‐device beamline at the Pohang Light Source is designed for high‐resolution spectroscopy and spectromicroscopy. The beamline will contain a variable‐included‐angle plane‐grating monochromator (VIA‐PGM) using a grating substrate which has seven different grooves with different depths. The advantages of this scheme will be the fixed exit‐slit position and the mechanical stability of the grating scan mechanism while changing the photon energy range. The beamline is designed to cover the photon energy range 20–2000 eV. The estimated spectral resolution, E /Δ E , is above 8000 in the photon energy range below 500 eV, and above 4000 for the remaining photon energy range. The estimated flux at the end‐station is of the order of 10 12 photons s −1 (0.1% bandwidth) −1 .