Open AccessUtilization of Photoemission Cross‐Section Effects for Monitoring Thin‐Film Growth in UHV
Author(s) -
Tucker N. P.,
Blyth R. I. R.,
White R. G.,
Lee M. H.,
Robinson A. W.,
Barrett S. D.
Publication year - 1995
Publication title -
journal of synchrotron radiation
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 1.172
H-Index - 99
ISSN - 1600-5775
DOI - 10.1107/s0909049595008697
Subject(s) - synchrotron radiation , photoemission spectroscopy , thin film , substrate (aquarium) , angle resolved photoemission spectroscopy , synchrotron , cross section (physics) , materials science , x ray photoelectron spectroscopy , inverse photoemission spectroscopy , atomic physics , signal (programming language) , optoelectronics , optics , physics , condensed matter physics , nanotechnology , electronic structure , nuclear magnetic resonance , computer science , oceanography , quantum mechanics , geology , programming language
Given the tunability of synchrotron radiation, photoemission spectroscopy can be used to monitor the growth modes of thin films in UHV. Cross‐section effects such as Cooper minima and resonant photoemission can be exploited to maximize the adsorbate signal and minimize that from the substrate. Under favourable circumstances growth can be monitored in real time at coverages of <1%. As an example the growth of Gd on W(110) is investigated.