Open AccessA Double Multilayer Monochromator at an ESRF Undulator for Microbeam Experiments
Author(s) -
Deschamps P.,
Engström P.,
Fiedler S.,
Riekel C.,
Wakatsuki S.,
Høghøj P.,
Ziegler E.
Publication year - 1995
Publication title -
journal of synchrotron radiation
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 1.172
H-Index - 99
ISSN - 1600-5775
DOI - 10.1107/s0909049595001592
Subject(s) - monochromator , microbeam , undulator , optics , beam (structure) , collimator , reflection (computer programming) , materials science , monochromatic color , bragg's law , physics , diffraction , wavelength , computer science , programming language
A water‐cooled double W/Si‐multilayer monochromator has been operated at an ESRF low‐ β undulator beam. For a fixed distance of the two multilayers the first‐order Bragg reflection was at ~8 keV. The peak power density of the beam at the exit of the multilayers was ~1 W mm −2 and the flux density of the first order after a 10 μm collimator was 4 × 10 5 photons s −1 μm −2 mA −1. The performance of the beam in microbeam diffraction has been tested on a 20 μm W wire. The observed pseudo‐Laue pattern is discussed with respect to the multilayer spectrum.