Open AccessSurface‐Sensitive XAFS in the Hard X‐ray Region with Sub‐Monolayer Sensitivity
Author(s) -
Oyanagi H.,
Shioda R.,
Kuwahara Y.,
Haga K.
Publication year - 1995
Publication title -
journal of synchrotron radiation
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 1.172
H-Index - 99
ISSN - 1600-5775
DOI - 10.1107/s0909049595001506
Subject(s) - x ray absorption fine structure , monolayer , wiggler , materials science , fluorescence , absorption (acoustics) , multipole expansion , sensitivity (control systems) , analytical chemistry (journal) , chemistry , optics , nanotechnology , physics , engineering , chromatography , quantum mechanics , electronic engineering , spectroscopy , cathode ray , composite material , electron
Surface‐sensitive X‐ray absorption fine structure (XAFS) with sub‐monolayer sensitivity based on grazing‐incidence fluorescence detection is reported. The efficiency of fluorescence detection increased by more than two orders of magnitude by combining a multipole wiggler with a multi‐element Si(Li) solid‐state detector. The capability of the present technique for structural studies of surfaces and buried interfaces in the hard X‐ray region was demonstrated by As K ‐edge XAFS studies of the InP(001) surface exposed to AsH 3 flow. The results indicated that ~0.1 monolayer As atoms are incorporated into the surface replacing the P atoms.