Open AccessOptimization of multilayer Laue lenses for a scanning X‐ray microscope
Author(s) -
Yan Hanfei,
Chu Yong S.
Publication year - 2013
Publication title -
journal of synchrotron radiation
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 1.172
H-Index - 99
ISSN - 1600-5775
DOI - 10.1107/s0909049512044883
Subject(s) - microscope , optics , beamline , synchrotron , apodization , resolution (logic) , materials science , x ray , microscopy , nanometre , diffraction , throughput , physics , computer science , beam (structure) , wireless , telecommunications , artificial intelligence
Multilayer Laue lenses (MLLs) have demonstrated great capabilities for efficiently focusing hard X‐rays down to the nanometer scale. Optimized use of MLLs in a scanning X‐ray microscope requires careful consideration of a number of practical parameters other than resolution and efficiency in order to optimize the microscope's performance and scientific throughput. Here, relationships among the apodization effect owing to the presence of a beamstop, the monochromaticity requirement and the allowable working distance are discussed, as well as their impacts on the performance of the optics. Based on these discussions, optimal MLL schemes aiming at 10 nm resolution for a scanning X‐ray microscope for the Hard X‐ray Nanoprobe (HXN) beamline at National Synchrotron Light Source II are presented.