Open AccessHybrid materials with an increased resistance to hard X‐rays using fullerenes as radical sponges
Author(s) -
Pinna Alessandra,
Malfatti Luca,
Piccinini Massimo,
Falcaro Paolo,
Innocenzi Plinio
Publication year - 2012
Publication title -
journal of synchrotron radiation
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 1.172
H-Index - 99
ISSN - 1600-5775
DOI - 10.1107/s0909049512012848
Subject(s) - fullerene , synchrotron , degradation (telecommunications) , hydroxylation , chemistry , radical , molecule , doping , photochemistry , materials science , chemical engineering , nanotechnology , optoelectronics , organic chemistry , optics , telecommunications , physics , computer science , enzyme , engineering
The protection of organic and hybrid organic–inorganic materials from X‐ray damage is a fundamental technological issue for broadening the range of applications of these materials. In the present article it is shown that doping hybrid films with fullerenes C 60 gives a significant reduction of damage upon exposure to hard X‐rays generated by a synchrotron source. At low X‐ray dose the fullerene molecules act as `radical scavengers', considerably reducing the degradation of organic species triggered by radical formation. At higher doses the gradual hydroxylation of the fullerenes converts C 60 into fullerol and a bleaching of the radical sinking properties is observed.