Open AccessModular deposition chamber for in situ X‐ray experiments during RF and DC magnetron sputtering
Author(s) -
Krause Bärbel,
Darma Susan,
Kaufholz Marthe,
Gräfe HansHellmuth,
Ulrich Sven,
Mantilla Miguel,
Weigel Ralf,
Rembold Steffen,
Baumbach Tilo
Publication year - 2012
Publication title -
journal of synchrotron radiation
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 1.172
H-Index - 99
ISSN - 1600-5775
DOI - 10.1107/s0909049511052320
Subject(s) - sputter deposition , sputtering , high power impulse magnetron sputtering , materials science , deposition (geology) , vacuum chamber , cavity magnetron , in situ , synchrotron , optoelectronics , vanadium , modular design , plasma , diffraction , vanadium carbide , ultra high vacuum , analytical chemistry (journal) , optics , thin film , chemistry , nanotechnology , physics , computer science , metallurgy , composite material , nuclear physics , biology , organic chemistry , sediment , operating system , paleontology , chromatography
A new sputtering system for in situ X‐ray experiments during DC and RF magnetron sputtering is described. The outstanding features of the system are the modular design of the vacuum chamber, the adjustable deposition angle, the option for plasma diagnostics, and the UHV sample transfer in order to access complementary surface analysis methods. First in situ diffraction and reflectivity measurements during RF and DC deposition of vanadium carbide demonstrate the performance of the set‐up.