Open AccessVersatile vacuum chamber for in situ surface X‐ray scattering studies
Author(s) -
Carbone Dina,
Plantevin Olivier,
Gago Raul,
Mocuta Cristian,
Bikondoa Oier,
Alija Alejandro,
Petit Lucien,
Djazuli Hamid,
Metzger TillHartmut
Publication year - 2008
Publication title -
journal of synchrotron radiation
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 1.172
H-Index - 99
ISSN - 1600-5775
DOI - 10.1107/s0909049508003944
Subject(s) - beamline , optics , scattering , synchrotron radiation , vacuum chamber , materials science , diffraction , beam (structure) , synchrotron , thin film , ultra high vacuum , physics , nanotechnology , composite material
A compact portable vacuum‐compatible chamber designed for surface X‐ray scattering measurements on beamline ID01 of the European Synchrotron Radiation Facility, Grenoble, is described. The chamber is versatile and can be used for in situ investigation of various systems, such as surfaces, nanostructures, thin films etc. , using a variety of X‐ray‐based techniques such as reflectivity, grazing‐incidence small‐angle scattering and diffraction. It has been conceived for the study of morphology and structure of semiconductor surfaces during ion beam erosion, but it is also used for the study of surface oxidation or thin film growth under ultra‐high‐vacuum conditions. Coherent X‐ray beam experiments are also possible. The chamber is described in detail, and examples of its use are given.