Open AccessA Shack–Hartmann measuring head for the two‐dimensional characterization of X‐ray mirrors
Author(s) -
Floriot Johan,
Levecq Xavier,
Bucourt Samuel,
Thomasset Muriel,
Polack François,
Idir Mourad,
Mercère Pascal,
Moreno Thierry,
Brochet Sylvain
Publication year - 2008
Publication title -
journal of synchrotron radiation
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 1.172
H-Index - 99
ISSN - 1600-5775
DOI - 10.1107/s0909049507066083
Subject(s) - optics , image stitching , physics , characterization (materials science) , curvature , metrology , extreme ultraviolet lithography , x ray optics , high dynamic range , microlens , translation (biology) , dynamic range , lens (geology) , x ray , geometry , mathematics , biochemistry , chemistry , messenger rna , gene
The recent development of short‐wavelength optics (X/EUV, synchrotrons) requires improved metrology techniques in terms of accuracy and curvature dynamic range. In this article a stitching Shack–Hartmann head dedicated to be mounted on translation stages for the characterization of X‐ray mirrors is presented. The principle of the instrument is described and experimental results for an X‐ray toroidal mirror are presented. Submicroradian performances can be achieved and systematic comparison with a classical long‐trace profiler is presented. The accuracy and wide dynamic range of the Shack–Hartmann long‐trace‐profiler head allow two‐dimensional characterizations of surface figure and curvature with a submillimeter spatial resolution.