Open AccessIn situ synchrotron X‐ray studies of ferroelectric thin films
Author(s) -
Fong D. D.,
Eastman J. A.,
Stephenson G. B.,
Fuoss P. H.,
Streiffer S. K.,
Thompson Carol,
Auciello O.
Publication year - 2005
Publication title -
journal of synchrotron radiation
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 1.172
H-Index - 99
ISSN - 1600-5775
DOI - 10.1107/s0909049504025816
Subject(s) - ferroelectricity , thin film , materials science , synchrotron , chemical vapor deposition , in situ , scattering , substrate (aquarium) , phase boundary , deposition (geology) , phase transition , phase (matter) , optics , analytical chemistry (journal) , condensed matter physics , nanotechnology , optoelectronics , chemistry , dielectric , geology , paleontology , physics , organic chemistry , chromatography , sediment , oceanography
In situ synchrotron X‐ray scattering was used to observe both the growth of PbTiO 3 films by metal‐organic chemical vapour deposition and the behaviour of the ferroelectric phase transition as a function of film thickness. The dependences of growth mode and deposition rate on gas flows and substrate temperature were determined by homoepitaxial growth studies on thick films (>50 nm). These studies facilitated the growth of thin coherently strained PbTiO 3 films on SrTiO 3 (001) substrates, with thicknesses ranging from 2 to 42 nm. Experiments on the ferroelectric phase transition as a function of film thickness were carried out in these films under controlled mechanical and electrical boundary conditions.