Open AccessImage quality improvement in a hard X‐ray projection microscope using total reflection mirror optics
Author(s) -
Mimura Hidekazu,
Yamauchi Kazuto,
Yamamura Kazuya,
Kubota Akihisa,
Matsuyama Satoshi,
Sano Yasuhisa,
Ueno Kazumasa,
Endo Katsuyoshi,
Nishino Yoshinori,
Tamasaku Kenji,
Yabashi Makina,
Ishikawa Tetsuya,
Mori Yuzo
Publication year - 2004
Publication title -
journal of synchrotron radiation
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 1.172
H-Index - 99
ISSN - 1600-5775
DOI - 10.1107/s090904950401283x
Subject(s) - optics , interference (communication) , wavelength , x ray optics , physics , interferometry , projection (relational algebra) , reflection (computer programming) , figuring , quality (philosophy) , curved mirror , intensity (physics) , image quality , materials science , x ray , image (mathematics) , computer science , computer network , channel (broadcasting) , algorithm , quantum mechanics , artificial intelligence , programming language
A new figure correction method has been applied in order to fabricate an elliptical mirror to realize a one‐dimensionally diverging X‐ray beam having high image quality. Mutual relations between figure errors and intensity uniformities of diverging X‐ray beams have also been investigated using a wave‐optical simulator and indicate that figure errors in relatively short spatial wavelength ranges lead to high‐contrast interference fringes. By using a microstitching interferometer and elastic emission machining, figure correction of an elliptical mirror with a lateral resolution close to 0.1 mm was carried out. A one‐dimensional diverging X‐ray obtained using the fabricated mirror was observed at SPring‐8 and evaluated to have a sufficiently flat intensity distribution.