Open AccessDiamond planar refractive lenses for third‐ and fourth‐generation X‐ray sources
Author(s) -
Nöhammer Bernd,
Hoszowska Joanna,
Freund Andreas K.,
David Christian
Publication year - 2003
Publication title -
journal of synchrotron radiation
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 1.172
H-Index - 99
ISSN - 1600-5775
DOI - 10.1107/s0909049502019532
Subject(s) - diamond , lens (geology) , optics , x ray optics , planar , materials science , fabrication , etching (microfabrication) , gradient index optics , full width at half maximum , electrostatic lens , electron beam lithography , lithography , cathode ray , refractive index , x ray , optoelectronics , electron , beam (structure) , physics , resist , nanotechnology , medicine , computer graphics (images) , alternative medicine , pathology , layer (electronics) , computer science , composite material , quantum mechanics
The fabrication and testing of planar refractive hard X‐ray lenses made from bulk CVD diamond substrates is reported. The lens structures were generated by electron‐beam lithography and transferred by reactive‐ion etching into the diamond. Various lens designs were fabricated and tested at 12.4 and 17.5 keV photon energy. Efficiencies of up to 71% and gains of up to 26 were achieved. A line focus of 3.2 µm (FWHM) was measured. These lenses should be able to withstand the extreme flux densities expected at the planned fourth‐generation X‐ray sources.