
Zernike‐type X‐ray imaging microscopy at 25 keV with Fresnel zone plate optics
Author(s) -
Awaji M.,
Suzuki Y.,
Takeuchi A.,
Takano H.,
Kamijo N.,
Tamura S.,
Yasumoto M.
Publication year - 2002
Publication title -
journal of synchrotron radiation
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 1.172
H-Index - 99
ISSN - 1600-5775
DOI - 10.1107/s0909049502004223
Subject(s) - zone plate , optics , zernike polynomials , microscope , beamline , undulator , phase contrast imaging , materials science , magnification , fresnel zone , x ray optics , resolution (logic) , image resolution , physics , x ray , beam (structure) , diffraction , phase contrast microscopy , wavefront , artificial intelligence , computer science
A Zernike‐type imaging microscope using a sputtered‐sliced Fresnel zone plate (SS‐FZP) has been developed and tested at an X‐ray energy of 25 keV. The SS‐FZP was used as an objective. A copper (Cu) phase plate was placed at the back focal plane of the SS‐FZP in order to produce phase contrast. The performance of the Zernike‐type imaging microscope was tested with a gold (Au) mesh and a resolution test pattern at undulator beamline 47 of SPring‐8. The Au mesh and the resolution test pattern could be imaged in transmission with a magnification of ×10.2. Owing to the Cu phase plate, different image contrast was observed compared with the bright‐field image contrast. Tantalum microstructures down to 0.5 µm line‐and‐space have been observed on spatial resolution test patterns.