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Simultaneous measurement of XANES in halide‐intercalated BSCCO(2212) using electron and fluorescence yield to compare their performance
Author(s) -
Saxena S. G.,
Dalela B.,
Dalela S.,
Chaturvedi D,
Singhal R. K.,
Parikh P.,
Jain D. C.,
Garg K. B.
Publication year - 2001
Publication title -
journal of synchrotron radiation
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 1.172
H-Index - 99
ISSN - 1600-5775
DOI - 10.1107/s0909049501000140
Subject(s) - yield (engineering) , fluorescence , orientation (vector space) , materials science , halide , electron , xanes , analytical chemistry (journal) , signal (programming language) , quantum yield , chemistry , optics , crystallography , physics , mathematics , spectral line , geometry , computer science , inorganic chemistry , chromatography , quantum mechanics , astronomy , metallurgy , programming language
Total Yield with an escape depth of ~100‐200 Å is known to be rather surface sensitive. Fluorescence Yield, on the other hand, with an escape depth of ~1000‐2000Å is relatively less prone to surface effects but necessitates some corrections to obtain the true signal. Both have their plus and minus points and, if used with care, yield reliable data. In the present experiment both the techniques have been simultaneously employed for measuring orientation dependent O K and the Cu L3 edges from an uncleaved surface of I(2)BSCCO(2212) single crystal to compare the performance of the two modes of detection. Despite glaring differences in intensities the results from the two appear to show reasonable agreement in respect of relative intensities of the spectral features.

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