Open AccessStructural modification on silica glass surface induced by thermal poling for second harmonic generation
Author(s) -
Nazabal V.,
Fargin E.,
Le Flem G.,
Briois V.,
Cartier Dit Moulin C.,
Buffeteau T.,
Desbat B.
Publication year - 2001
Publication title -
journal of synchrotron radiation
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 1.172
H-Index - 99
ISSN - 1600-5775
DOI - 10.1107/s090904950001829x
Subject(s) - poling , materials science , xanes , thermal , bridging (networking) , second harmonic generation , scattering , thermal treatment , composite material , spectroscopy , silicon , chemical physics , optics , optoelectronics , chemistry , thermodynamics , computer network , laser , physics , quantum mechanics , computer science , dielectric , ferroelectricity
O‐K edge XANES spectroscopy evidences structural modification induced by thermal poling treatment in surfaces of bulk Herasil silica glass presenting second harmonic generation. Considering model silicon dioxide clusters, calculations based on full multiple scattering approach have been performed in order to explain accurately the differences observed on XANES spectra at different stage of the poling treatment. These structural modifications on extreme surface affect both network and defects by breaking Si‐O‐Si bridging bonds. Despite of the formation of bridging bond occurring during the thermal depoling ‐which erases the SHG inside the glass‐, the initial structure of the unpoled sample is not reproduced.