Open AccessDevelopment of an in situ polarization‐dependent total‐reflection fluorescence XAFS measurement system
Author(s) -
Chun WangJae,
Tanizawa Yasuhiro,
Shido Takafumi,
Iwasawa Yasuhiro,
Nomura Masaharu,
Asakura Kiyotaka
Publication year - 2001
Publication title -
journal of synchrotron radiation
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 1.172
H-Index - 99
ISSN - 1600-5775
DOI - 10.1107/s0909049500016472
Subject(s) - x ray absorption fine structure , goniometer , analytical chemistry (journal) , vacuum chamber , spectroscopy , materials science , x ray photoelectron spectroscopy , chemistry , optics , nuclear magnetic resonance , crystallography , physics , chromatography , quantum mechanics , composite material
An in situ polarization‐dependent total‐reflection fluorescence X‐ray absorption fine structure (PTRF‐XAFS) spectroscopy system has been developed, which enables PTRF‐XAFS experiments to be performed in three different orientations at various temperatures (273–600 K) and pressures (10 −10 ∼760 torr). The system consists of a measurement chamber and a preparation chamber. The measurement chamber has a high‐precision six‐axis goniometer and a multi‐element solid‐state detector. Using a transfer chamber, also operated under ultra‐high‐vacuum conditions, the sample can be transferred to the measurement chamber from the preparation chamber, which possesses low‐energy electron diffraction, Auger electron spectroscopy and X‐ray photoelectron spectroscopy facilities, as well as a sputtering gun and an annealing system. The in situ PTRF‐EXAFS for Cu species on TiO 2 (110) has been measured in three different orientations, revealing anisotropic growth of Cu under the influence of the TiO 2 (110) surface.