Open AccessTransmission phase gratings for EUV interferometry
Author(s) -
Naulleau Patrick P.,
Cho Chang Hyun,
Gullikson Eric M.,
Bokor Jeffrey
Publication year - 2000
Publication title -
journal of synchrotron radiation
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 1.172
H-Index - 99
ISSN - 1600-5775
DOI - 10.1107/s0909049500010670
Subject(s) - optics , grating , extreme ultraviolet lithography , interferometry , diffraction , diffraction grating , diffraction efficiency , materials science , phase (matter) , blazed grating , beam splitter , transmission (telecommunications) , reflection (computer programming) , optoelectronics , physics , computer science , telecommunications , laser , quantum mechanics , programming language
The performance of the recently developed EUV phase‐shifting point diffraction interferometer (PS/PDI) depends heavily on the characteristics of the grating beamsplitter used in the implementation. Ideally, such a grating should provide throughput of better than 25% and diffraction efficiency, defined as the ratio of the first‐diffracted‐order power to the zero‐order power, variable in the range from approximately 10 to 500. The optimal method for achieving these goals is by way of a phase grating. Also, PS/PDI system implementation issues favor the use of transmission gratings over reflection gratings. Here, the design, fabrication, and characterization of a recently developed transmission phase grating developed for use in EUV interferometry is described.