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Texture and residual‐stress analysis using a kappa goniometer
Author(s) -
Guillén R.,
François M.,
Bourniquel B.,
Girard E.
Publication year - 1999
Publication title -
journal of applied crystallography
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 1.429
H-Index - 162
ISSN - 1600-5767
DOI - 10.1107/s0021889898015064
Subject(s) - goniometer , kappa , residual stress , texture (cosmology) , tilt (camera) , materials science , reliability (semiconductor) , optics , stress (linguistics) , residual , diffraction , computer science , physics , artificial intelligence , mathematics , composite material , geometry , algorithm , image (mathematics) , power (physics) , linguistics , philosophy , quantum mechanics
A kappa goniometer allowing the analysis of large samples (thickness up to 60 mm) has been constructed. It was designed to perform the analysis of crystalline texture and residual stress by X‐ray diffraction with both χ‐ (or Ψ‐) and Ω‐type assembly configurations. Tilt‐angle values up to 80° and 2θ values up to 165° can be reached. Validation has been achieved by checking the setting precision and the assembly reliability for the two types of configuration for which the system has been designed.