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X‐ray diffraction study of concentration depth profiles of binary alloy coatings during thermal diffusion: application to brass coating
Author(s) -
Bolle B.,
Tidu A.,
Heizmann J. J.
Publication year - 1999
Publication title -
journal of applied crystallography
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 1.429
H-Index - 162
ISSN - 1600-5767
DOI - 10.1107/s0021889898009765
Subject(s) - brass , materials science , diffraction , coating , diffusion , alloy , thermal diffusivity , diffusion layer , layer (electronics) , thermal , analytical chemistry (journal) , composite material , metallurgy , optics , chemistry , copper , thermodynamics , physics , chromatography
Using the Houska method based on X‐ray diffraction‐line profile analysis, new mathematical treatments are proposed to compute directly the concentration depth profile of thin films obtained by diffusion. As an example, concentration depth profiles of a brass layer have been studied during the thermal diffusion process. This nondestructive method is fast (a few minutes) and allows the sample to be used for complementary analysis if necessary.