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Effect of Thermal Diffuse Scattering in Triple‐Crystal Diffractometry with High‐Energy Synchrotron Radiation
Author(s) -
Schmidt T.,
Woo D.,
Keitel S.,
Schneider J. R.,
Lambert U.,
Zulehner W.
Publication year - 1998
Publication title -
journal of applied crystallography
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 1.429
H-Index - 162
ISSN - 1600-5767
DOI - 10.1107/s0021889898002684
Subject(s) - diffractometer , synchrotron radiation , scattering , phonon , crystal (programming language) , synchrotron , reflection (computer programming) , optics , thermal , materials science , radiation , single crystal , physics , computational physics , molecular physics , condensed matter physics , nuclear magnetic resonance , thermodynamics , scanning electron microscope , computer science , programming language
The thermal diffuse scattering around reflection 220 of a thick, perfect silicon crystal has been studied quantitatively by means of a triple‐crystal diffractometer and 100 keV synchrotron radiation. The necessary fitting procedures were simplified by deriving an analytic solution to the instrumental resolution function for nondispersive setting of three perfect crystals. The temperature and q dependence of the thermal diffuse scattering are very well described, taking only acoustical phonons into account; the contribution of optical phonons has been calculated explicitly.