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In Situ Fixed‐Angle X‐ray Reflectivity Measurement of Thin‐Film Roughness and Thickness during Deposition
Author(s) -
Lee C.H.,
Tseng S.Y.
Publication year - 1998
Publication title -
journal of applied crystallography
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 1.429
H-Index - 162
ISSN - 1600-5767
DOI - 10.1107/s002188989700928x
Subject(s) - surface finish , optics , materials science , surface roughness , thin film , oscillation (cell signaling) , intensity (physics) , x ray reflectivity , reflectivity , amplitude , deposition (geology) , composite material , physics , chemistry , geology , nanotechnology , paleontology , biochemistry , sediment
X‐ray reflectivity was used to measure in situ the surface roughness and thickness of a thin film during thin‐film growth. In this experiment, the sample and detector positions were held at fixed angles. An oscillating reflectivity intensity as a function of time was observed as the film thickness grew. The oscillation amplitude was damped as the surface roughness increased. Surface roughness as a function of time can be determined by analyzing the profile of oscillation intensity.