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X‐ray Reflectometer for the Diagnostics of Thin Films During Growth
Author(s) -
Niggemeier U.,
Lischka K.,
Plotz W. M.,
Holy V.
Publication year - 1997
Publication title -
journal of applied crystallography
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 1.429
H-Index - 162
ISSN - 1600-5767
DOI - 10.1107/s0021889897002483
Subject(s) - diffractometer , optics , materials science , reflectivity , thin film , x ray , angular resolution (graph drawing) , resolution (logic) , x ray reflectivity , physics , nanotechnology , mathematics , scanning electron microscope , combinatorics , artificial intelligence , computer science
A new experimental set‐up is described that allows the measurement of the X‐ray reflectivity of thin layers that are contained in a growth chamber ( in situ ). The X‐ray reflectivity measured with our angular dispersive glancing incidence reflectometer is identical, within experimental error, to that measured with a conventional high‐resolution diffractometer.