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Electron Diffraction Patterns of Fibrous and Lamellar Textured Polycrystalline Thin Films. II. Applications
Author(s) -
Tang L.,
Feng Y. C.,
Lee L.L.,
Laughlin D. E.
Publication year - 1996
Publication title -
journal of applied crystallography
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 1.429
H-Index - 162
ISSN - 1600-5767
DOI - 10.1107/s0021889896000416
Subject(s) - lamellar structure , crystallite , materials science , electron diffraction , crystallography , diffraction , selected area diffraction , thin film , reflection high energy electron diffraction , electron backscatter diffraction , texture (cosmology) , composite material , optics , microstructure , nanotechnology , chemistry , transmission electron microscopy , metallurgy , physics , computer science , image (mathematics) , artificial intelligence
Electron diffraction patterns of a sputter‐deposited poly crystalline MgO thin film on an SiO 2 substrate, of a Ta thin film and of CoCrTa/Cr bilayer films on glass substrates are presented and analyzed based on the theory developed in Paper I [Tang & Laughlin (1996). J. Appl. Cryst. 29 , 411–418]. It is found that the MgO film is [001] textured with a distribution angle of 13°. The Ta film is composed both of randomly oriented grains and [011] textured grains. The [011] texture axis distribution angle of the Ta film is determined to be 11° (11O)CoCrTa/(001)Cr and (101)CoCrTa/(011)Cr polycrystalline epitaxy are identified in the CoCrTa/Cr bilayer films. Both the bilayer films have a texture axis distribution angle of 6°.